Our offer
Our goal is to be the best and fastest service provider of high
quality thin film sputter deposition and thin film processing
services for small batches and projects.
Speed: Our customers can often get samples sputtered and
delivered within a week.
Versatility: We can sputter almost any material on a wide
variety of substrates, small and large.
Complete: We cover material deposition, processing, material
characterization and device measurements.
Our services
NanOsc has a a complete 4" production line for spintronic
devices. This includes deposition, patterning, metrology and
measurements on any substrate up to 4", with some steps accepting
6" wafers. We can give you access to any specific part of our
production/measurement chain that you may need.
Our specialty is small series and fast turnaround at a very
competitive cost. We can often sputter a small batch of samples
within one week from inquiry. We can deposit most materials you may
want, up to as many as 7 in combination. Both metals and
dielectrics can be deposited in the system we use.
Examples: Al, Ti,Co,Ni, Fe, NiFe, CoFe, CoFeB, Au, Ag, Pt, Pd,
SiO2, MgO and any combinations of said materials. Contact us for
any request of special materials.
We have a number of different measurement techniques available
for characterization of the deposited films.
- Magnetometers for measurement of magnetic properties.
- Magnetoresistance and ferromagnetic resonance.
- Access to several thin film metrology tools.
- X-ray diffraction of polycrystalline thin films. Especially for
very thin layers (few nm).
- Scanning Electron Microscope images.
We can pattern and etch most metals on up to 6" wafers. We etch
the metals with either Ar sputtering or reactive ion etch. If you
have a project where you need to etch thin metals, please don't
hesitate to contact us.
Get in touch
Please contact Johan Persson for more info
johan.persson@nanosc.se
+46-(0)8-7519016